Tokyo Electron 3S80-000007-11渦輪增壓泵 PDF資料
1.產(chǎn) 品 資 料 介 紹：
中文資料：
Tokyo Electron (TEL) 3S80-000007-11 渦輪增壓泵 — 產(chǎn)品應(yīng)用領(lǐng)域詳解
一、產(chǎn)品功能定位
3S80-000007-11 渦輪增壓泵（Turbo Molecular Pump，簡稱 TMP）是 Tokyo Electron 半導(dǎo)體設(shè)備中用于維持真空環(huán)境的核心部件之一。它通常用于中高真空段，具有高速旋轉(zhuǎn)葉輪結(jié)構(gòu)，適用于對潔凈度、穩(wěn)定性要求極高的真空工藝。
二、主要應(yīng)用領(lǐng)域
1. 半導(dǎo)體真空處理設(shè)備的真空系統(tǒng)
核心作用：為晶圓加工腔體（如刻蝕腔、CVD 腔、PVD 腔等）提供中高真空環(huán)境；
目標(biāo)真空范圍：10?3 Pa 至 10?? Pa；
典型設(shè)備：
等離子刻蝕設(shè)備（Etcher）
原子層沉積（ALD）系統(tǒng)
化學(xué)氣相沉積（CVD）
金屬有機(jī)化學(xué)氣相沉積（MOCVD）
2. 高潔凈工藝環(huán)境維持
無油結(jié)構(gòu)：渦輪分子泵不使用潤滑油，杜絕油污染，適用于超高潔凈環(huán)境；
低振動/低噪音：適合敏感工藝操作，如薄膜沉積、離子注入、真空退火等；
反應(yīng)控制：為高精度溫控、氣流控制提供穩(wěn)定真空基礎(chǔ)。
英文資料：
Tokyo Electron (TEL) 3S80-00007-11 Turbocharging Pump - Product Application Field Detailed Explanation
1、 Product functional positioning
The 3S80-00007-11 Turbo Molecular Pump (TMP) is one of the core components used to maintain a vacuum environment in Tokyo Electron semiconductor equipment. It is usually used in medium to high vacuum sections, with a high-speed rotating impeller structure, suitable for vacuum processes that require extremely high cleanliness and stability.
2、 Main application areas
1. Vacuum system of semiconductor vacuum processing equipment
Core function: To provide a medium to high vacuum environment for wafer processing chambers (such as etching chambers, CVD chambers, PVD chambers, etc.);
Target vacuum range: 10 ?3 Pa to 10 ?? Pa;
Typical equipment:
Plasma etching equipment (Etcher)
Atomic Layer Deposition (ALD) System
Chemical Vapor Deposition (CVD)
Metal Organic Chemical Vapor Deposition (MOCVD)
2. Maintenance of High Cleanliness Process Environment
Oil free structure: The turbo molecular pump does not use lubricating oil, eliminating oil pollution and suitable for ultra clean environments;
Low vibration/low noise: suitable for sensitive process operations such as thin film deposition, ion implantation, vacuum annealing, etc;
Reaction control: provides a stable vacuum foundation for high-precision temperature control and airflow control.
2.產(chǎn) 品 展 示
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| 369-HI-R-M-0-0-H-E | 531X301DCCASM1 | IC3603A280A |
| 369-Hi-R-M-0-0-H-0 | 531X306LCCBDM2 | IC3603A279A |
| 369-HI-R-M-0-0-0-E | 531X306LCCBBM1 | IC3603A278F |
| 369-HI-R-M-0-0-0 | 531X306LCCBAM1 | IC3603A278B |
| 369-HI-R-M-0-0 | 531X306LCCAEM1 | IC3603A277A |
| 369-HI-R-B-0-E-0-E | 531X306LCCADM1 | IC3603A200C |
| 369-HI-R-B-0-0 | 531X306LCCAAM1 | IC3603A200B |
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