Tokyo Electron 3397-220047-2X冷水機(jī)組件 PDF資料
1.產(chǎn) 品 資 料 介 紹：
中文資料：
Tokyo Electron 3397-220047-2X 冷水機(jī)組件（Chiller Unit） 是一款專用于 TEL 半導(dǎo)體制造設(shè)備的熱管理子系統(tǒng)，主要用于控制工藝設(shè)備中關(guān)鍵部件的溫度，確保其在高精度、高穩(wěn)定性的環(huán)境下運(yùn)行。該組件通常集成于蝕刻、沉積、光刻等高真空、高溫工藝平臺(tái)中。
一、產(chǎn)品功能概述
設(shè)備類型：冷水機(jī)組件（液冷循環(huán)單元）
主要功能：
為設(shè)備提供穩(wěn)定的冷卻液溫度；
調(diào)節(jié)腔體、加熱板、RF電源或激光光源的運(yùn)行溫度；
與主控制系統(tǒng)聯(lián)動(dòng)，實(shí)現(xiàn)動(dòng)態(tài)溫控與異常報(bào)警。
二、核心應(yīng)用領(lǐng)域
1. 等離子蝕刻設(shè)備（Plasma Etcher）
冷卻反應(yīng)腔、基板平臺(tái)和 RF 匹配網(wǎng)絡(luò)；
降低腔體壁面溫度，抑制粒子生成，提高蝕刻均勻性與良率。
2. CVD/ALD 沉積設(shè)備
控制沉積腔體、基板、管道等的熱管理系統(tǒng)；
防止材料結(jié)晶或不均勻沉積，提升膜厚一致性。
3. 光刻系統(tǒng)（Photolithography）
穩(wěn)定光源模塊（如激光、LED）的運(yùn)行溫度；
支持曝光平臺(tái)、鏡頭組件的熱補(bǔ)償和散熱。
4. 顯影/清洗設(shè)備
控制化學(xué)液體（如顯影劑、去膠液）或清洗腔體溫度；
保證工藝液體在設(shè)定溫度下反應(yīng)，避免過度或不足清洗。
英文資料：
The Tokyo Electron 3397-2200047-2X chiller unit is a thermal management subsystem specifically designed for TEL semiconductor manufacturing equipment. It is primarily used to control the temperature of critical components in process equipment, ensuring their operation in high-precision and high stability environments. This component is typically integrated into high vacuum, high-temperature process platforms such as etching, deposition, and photolithography.
1、 Product Function Overview
Equipment type: chiller component (liquid cooling circulation unit)
Main functions:
Provide stable coolant temperature for the equipment;
Adjust the operating temperature of the cavity, heating plate, RF power supply, or laser light source;
Integrate with the main control system to achieve dynamic temperature control and abnormal alarm.
2、 Core application areas
1. Plasma Etcher
Cooling reaction chamber, substrate platform, and RF matching network;
Reduce the temperature of the cavity wall, suppress particle generation, and improve etching uniformity and yield.
2. CVD/ALD deposition equipment
Thermal management system for controlling deposition chambers, substrates, pipelines, etc;
Prevent material crystallization or uneven deposition, and improve film thickness consistency.
3. Photolithography system
Stable operating temperature of light source modules (such as lasers and LEDs);
Support thermal compensation and heat dissipation for exposure platforms and lens components.
4. Developing/cleaning equipment
Control the temperature of chemical liquids (such as developer, adhesive remover) or cleaning chambers;
Ensure that the process liquid reacts at the set temperature and avoid excessive or insufficient cleaning.
2.產(chǎn) 品 展 示
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